AGC Flat Glass North America, Asahi Glass Assigned Patent

Silicon thin film deposition for photovoltaic device applications AGC Flat Glass North America, Alpharetta, Ga., and Asahi Glass, Tokyo, have been assigned a patent (8,273,595) developed by Christopher R.

Cording, Kingsport, Tenn., Matthew Spencer, Gray, Tenn., and Kunio Masumo, Zama, Japan, for a "silicon thin film deposition for photovoltaic device applications." The abstract of the patent published by the U.S. Patent and Trademark Office states: "The present invention provides for cost-efficient methods for on-line deposition of semi-conducting metallic layers. More specifically, the present invention provides on-line pyrolytic deposition methods for deposition of p-type, n-type and i-type semi-conducting metallic layers in the float glass production process. Furthermore, the present invention provides for on-line pyrolytic deposition methods for production of single-, double-, triple- and multi-junction p-(i-)n and n-(i-)p type semi-conducting metal layers. Such p-type, n-type and i-type semi-conducting metal layers are useful in the photovoltaic industry and attractive to manufacturers of photovoltaic modules as "value-added" products."

The patent application was filed on April 7, 2010 (12/755,712). The full-text of the patent can be found here.

600450 AGC Flat Glass North America, Asahi Glass Assigned Patent

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