Asahi: Successful development of a fluoropolymer photoresist base

Asahi Glass Co., Ltd. announced that it has succeeded in using a high-transparency fluoropolymer, a leading candidate for next-next generation photolithographic semiconductor manufacturing using F2 (fluoride dimer) excimer lasers, as a photoresist base polymer in a 250nm film, to create the world's first 100nm-width fine pattern.

The company has been following the development roadmap agreed under the Project Asuka private-industry collaborative program with its theme of developing 0.07-micron line-width semiconductors. AGC successfully developed, in February of 2001, a high-transparency fluoropolymer as a photoresist base polymer for use with F2 lasers. Subsequently, working with Selete, various evaluations of its viability as photoresist have been performed, including its development characteristics, resolution and suitability for dry etching and "spin-on" coating.

The most difficult technical challenge in the practical implementation was to use an F2 laser in actual photolithography to form fine patterns in resist coatings 200 to 300nm thick. AGC successfully designed and synthesized the new high-transparency fluoropolymer to achieve an absorption coefficient of less than 1.0 æm-1 for 157nm light. Since then, Selete has evaluated the new fluoropolymer as capable of forming a 100nm fine pattern in a practical 250nm coating. The fluoropolymer has an extremely high development sensitivity of less than 10mj/cm2, confirming that it possesses most desirable characteristic for the formulation of highly sensitive photoresist materials. AGC currently supplies industry with fluoropolymers including PTFE for semiconductor manufacturing facilities, and itself manufactures and supplies an 80% share of the transparent fluoropolymers for pellicles used in photo mask covers with KrF lasers. It has also begun high volume production of Cytop© for pellicles with next generation ArF lasers. The company is exploiting its core capabilities in fluorochemical engineering to provide a wide lineup of fluoropolymers.

Worldwide demand for photoresist used in semiconductor manufacturing is put at 80 to 90 billion per year. AGC is working to provide timely samples to resist producers, production equipment manufacturers and device makers by boosting its prototype production facilities in time for spring, 2002, while simultaneously preparing to strengthen development work and expand production capacity in time for the expected start-up of F2 laser production in 2005 and for the roll-out of high-volume production in 2007.

600450 Asahi: Successful development of a fluoropolymer photoresist base

See more news about:

Others also read

Mappi expanding in Asian markets
With great pleasure, in these days Mappi concluded a strategic partnership with EUROTECHCORP the leading company in Viet Nam and South East Asia Countries with more than 20 years of experiences in consulting e supplying top of the range equipment line. 
Check out the exhibitors at ASEAN's largest glass show, Glasstech Asia 2018 & Fenestration Asia 2018!
Malaysia International Trade & Exhibition Centre (MITEC); Kuala Lumpur; 14 - 16 November 2018.
Adelio Lattuada – Eurotechcorp cooperation
New agent for Vietnam, Thailand, Indonesia, Philippine, Malaysia, Lao, Cambodia, Myanmar, Singapore.
ASEAN's largest glass show returns to Malaysia
Glasstech Asia 2018 in conjunction with Fenestration Asia 2018.
Expansion of production capacity | SEKISUI S-Lec
Increased Production Capacity of Interlayer Film for Laminated Glass and Raw Material Resin in Europe.
New application of NEXNOVO glass wall for South Tower in Japan
More and more glass building wall appear in our modern city, especially in busy areas. The more buildings, the more creative designs. Passersby are easily absorbed by those creative buildings. That’s why advertising has higher value in central area.

Add new comment